On the lithography floor, photoresist bake isn’t a suggestion—it’s a boundary condition. A 0.5°C drift will show up in critical dimension control, and hot-zone nonuniformity will quietly eat yield across the lot. You need a heater that behaves like OEM, without tying you to a single vendor. We build custom infrared heaters for wafer-level thermal control, targeted at photoresist soft bake and hard bake. The system holds wafer-plane uniformity within ±0.1°C, and setpoint repeatability is tight enough to protect your thermal budget. We use near-infrared emitters because they couple energy directly into the wafer stack—response is fast, with minimal lag between command and result. The hardware is cleanroom-compatible for Class 1–100, and every interface is laid out to keep particle generation at zero. Power density, voltage, and dimensions are specified to match your chamber envelope and connector requirements, so it drops in as a thermal subsystem without rework. We validate performance against international semiconductor equipment thermal standards and supply the measurement data—uniformity maps, ramp-to-soak time, stability under load—so the replacement is traceable, not guesswork. The payoff: stable bake profiles, less scrap, and maintenance intervals you can plan around. Installation is straightforward, but treat the thermal interface as a critical control point. Confirm mechanical alignment and gasket compression to keep the clean seal intact; even small leaks will wreck particle performance. Plan a short commissioning run to finalize PID tuning against your carrier and batch dynamics.